Shigeyuki Iwasa: search on Z-Library

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1

Molecular design and development of photoresists for ArF excimer laser lithography

Etsuo Hasegawa, Katsumi Maeda, Shigeyuki Iwasa

Journal:

Polymers for Advanced Technologies

Year:

2000

Language:

english

File:

PDF, 277 KB

english, 2000

2

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Positive chemically amplified resist for ArF excimer laser lithography composed of a novel transparent photoacid generator and an alicyclic terpolymer

Nakano, Kaichiro, Maeda, Katsumi, Iwasa, Shigeyuki, Ohfuji, Takeshi, Hasegawa, Etsuo, Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 809 KB

english, 1995

3

Photo-acid generator having aromatic ketone structure for ArF chemically amplified resist

Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 468 KB

english, 2002

4

Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193-nm Lithography.

Nakano, Kaichiro, Maeda, Katsumi, Iwasa, Shigeyuki, Hasegawa, Etsuo

Journal:

Journal of Photopolymer Science and Technology

Year:

1997

Language:

english

File:

PDF, 568 KB

english, 1997

5

ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer

Maeda, Katsumi, Nakano, Kaichiro, Iwasa, Shigeyuki, Hasegawa, Etsuo

Journal:

Japanese Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 490 KB

english, 2001

6

Design of Transparent and Thermally Stable Photo-Acid Generators for 193-nm Lithography.

Iwasa, Shigeyuki, Nakano, Kaichiro, Maeda, Katsumi, Hasegawa, Etsuo

Journal:

Journal of Photopolymer Science and Technology

Year:

2000

Language:

english

File:

PDF, 120 KB

english, 2000

7

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Function-integrated alicyclic polymer for ArF chemically amplified resists

Maeda, Katsumi, Nakano, Kaichiro, Iwasa, Shigeyuki, Hasegawa, Etsuo, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 447 KB

english, 1997

8

Cationic Polymerization of Poly(vinyl ether) Bearing a TEMPO Radical: A New Cathode-Active Material for Organic Radical Batteries

Masahiro Suguro, Shigeyuki Iwasa, Yuki Kusachi, Yukiko Morioka, Kentaro Nakahara

Journal:

Macromolecular Rapid Communications

Year:

2007

Language:

english

File:

PDF, 147 KB

english, 2007

9

A prospective, multicenter phase II study of the efficacy and feasibility of 15-min panitumumab infusion plus irinotecan for oxaliplatin- and irinotecan-refractory, KRAS wild-type metastatic colorectal cancer (SHIP)

Akiyoshi, Kohei, Hamaguchi, Tetsuya, Yoshimura, Kenichi, Takahashi, Naoki, Honma, Yoshitaka, Iwasa, Satoru, Takashima, Atsuo, Kato, Ken, Yamada, Yasuhide, Onodera, Hisashi, Takeshita, Shigeyuki, Yasui

Journal:

Clinical Colorectal Cancer

Year:

2017

Language:

english

File:

PDF, 932 KB

english, 2017

10

Chemically Amplified Resist for ArF Excimer Laser Lithography Composed of an Alkylsulfonium Salt Photoacid Generator and an Alicyclic Terpolymer.

NAKANO, Kaichiro, OHFUJI, Takeshi, MAEDA, Katsumi, IWASA, Shigeyuki, HASEGAWA, Etsuo

Journal:

KOBUNSHI RONBUNSHU

Year:

1996

File:

PDF, 4.73 MB

1996

11

Enhancement of rapid charging capability of organic radical battery using ethylene carbonate-based electrolyte containing LiFSI

Iwasa, Shigeyuki, Nishi, Takanori, Nakamura, Shin

Journal:

Journal of Power Sources

Year:

2018

Language:

english

File:

PDF, 1.42 MB

english, 2018

12

Electrochemical Characterization of TEMPO Radical in Ionic Liquids

MARUYAMA, Yuki, NAGAMINE, Kuniaki, NOMURA, Ayako, IWASA, Shigeyuki, TOKITO, Shizuo

Journal:

Electrochemistry

Year:

2020

Language:

english

File:

PDF, 1.39 MB

english, 2020

13

Effect of Ethylene Oxide Structures in TEMPO Polymers on High Rate Discharge Properties

Suguro, Masahiro, Iwasa, Shigeyuki, Nakahara, Kentaro

Journal:

Electrochemical and Solid-State Letters

Year:

2009

Language:

english

File:

PDF, 396 KB

english, 2009

14

In-situ observation of Ga adsorption during TMGa exposure on GaAs(001) surfaces with various As coverages

Shigeyuki Otake, Akira Sakamoto, Masateru Yamamoto, Izumi Iwasa

Journal:

Applied Surface Science

Year:

1994

Language:

english

File:

PDF, 466 KB

english, 1994

15

Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists.

Nakano, Kaichiro, Iwasa, Shigeyuki, Maeda, Katsumi, Hasegawa, Etsuo

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 374 KB

english, 2001

16

Metalorganic chemical vapor deposition growth of Ga-rich (x > 0.5) GaxIn1−xP on GaAs

Takeshi Ota, Shigeyuki Otake, Izumi Iwasa

Journal:

Journal of Crystal Growth

Year:

1993

Language:

english

File:

PDF, 382 KB

english, 1993

17

Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist

Maeda, Katsumi, Nakano, Kaichiro, Iwasa, Shigeyuki, Hasegawa, Etsuo, Shirai, Masamitsu

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 152 KB

english, 2007

18

GaAs (001) surface balanced with arsine partial pressure in metalorganic chemical vapor deposition reactor observed by surface photoabsorption

Akira Sakamoto, Shigeyuki Otake, Masateru Yamamoto, Izumi Iwasa

Journal:

Journal of Crystal Growth

Year:

1994

Language:

english

File:

PDF, 453 KB

english, 1994

19

Organic radical battery: nitroxide polymers as a cathode-active material

Hiroyuki Nishide, Shigeyuki Iwasa, Yong-Jin Pu, Takeo Suga, Kentaro Nakahara, Masaharu Satoh

Journal:

Electrochimica Acta

Year:

2004

Language:

english

File:

PDF, 104 KB

english, 2004

20

Optical Properties of GaAs(001) Surface during Desorption of As Atoms

Sakamoto, Akira, Otake, Shigeyuki, Iwasa, Izumi

Journal:

Japanese Journal of Applied Physics

Year:

1993

File:

PDF, 499 KB

1993

21

10.5104/jiep.14.427

Iwasa, Shigeyuki

Journal:

Journal of Japan Institute of Electronics Packaging

Year:

2011

File:

PDF, 1.22 MB

2011

22

Chemically Amplified Negative Resists Based on Alicyclic Acrylate Polymers for 193-nm Lithography.

Iwasa, Shigeyuki, Maeda, Katsumi, Hasegawa, Etsuo

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

Language:

english

File:

PDF, 334 KB

english, 1999

23

Catheter interventional treatment in Kawasaki disease: A report from the Japanese Pediatric Interventional Cardiology Investigation Group

Teiji Akagi, Shunichi Ogawa, Toshihiro Ino, Mitsuji Iwasa, Shigeyuki Echigo, Kenji Kishida, Kiyoshi Baba, Masaki Matsushima, Kenji Hamaoka, Hideshi Tomita, Masahiro Ishii, Hirohisa Kato

Journal:

The Journal of Pediatrics

Year:

2000

Language:

english

File:

PDF, 67 KB

english, 2000

24

The production of an electrochemical capacitor electrode using holey single-wall carbon nanohorns with high specific surface area

Yuge, Ryota, Manako, Takashi, Nakahara, Kentaro, Yasui, Motoharu, Iwasa, Shigeyuki, Yoshitake, Tsutomu

Journal:

Year:

2012

Language:

english

File:

PDF, 333 KB

english, 2012

25

ArF Chemically Amplified Negative Resist Using Alicyclic Epoxy Polymer.

Maeda, Katsumi, Iwasa, Shigeyuki, Nakano, Kaichiro, Hasegawa, Etsuo

Journal:

Journal of Photopolymer Science and Technology

Year:

1998

Language:

english

File:

PDF, 411 KB

english, 1998

26

Synthesis of well-defined norbornene–lactone-functionalized polymers via ATRP

Takuma Miyazaki, Boyong Xue, Kazufumi Kohno, Etsuo Hasegawa, Shigeyuki Iwasa, Akinori Toyota

Journal:

Polymer Bulletin

Year:

2010

Language:

english

File:

PDF, 320 KB

english, 2010

27

Sustained release of a water-soluble GP IIb/IIIa antagonist from copoly(dl-lactic/glycolic)acid microspheres

Shigeyuki Takada, Tomofumi Kurokawa, Keiko Miyazaki, Susumu Iwasa, Yasuaki Ogawa

Journal:

International Journal of Pharmaceutics

Year:

1997

Language:

english

File:

PDF, 816 KB

english, 1997

28

Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists.

Iwasa, Shigeyuki, Maeda, Katsumi, Nakano, Kaichiro, Ohfuji, Takeshi, Hasegawa, Etsuo

Journal:

Journal of Photopolymer Science and Technology

Year:

1996

Language:

english

File:

PDF, 396 KB

english, 1996

29

Syntheses and Electrochemical Properties of TEMPO Radical Substituted Silicones: Active Material for Organic Radical Batteries

Masahiro Suguro, Atsunori Mori, Shigeyuki Iwasa, Kentaro Nakahara, Kaichiro Nakano

Journal:

Macromolecular Chemistry and Physics

Year:

2009

Language:

english

File:

PDF, 283 KB

english, 2009

30

Effect of charge transportation on high-rate discharge properties of organic radical batteries with gel-state cathode

Iwasa, Shigeyuki, Nishi, Takanori, Nakamura, Shin

Journal:

Journal of Electroanalytical Chemistry

Year:

2017

Language:

english

File:

PDF, 958 KB

english, 2017

31

Utilization of an Amorphous Form of a Water-Soluble GPIIb/IIIa Antagonist for Controlled Release from Biodegradable Microspheres

Shigeyuki Takada, Tomofumi Kurokawda, Keiko Miyazaki, Susumu Iwasa, Yasuaki Ogawa

Journal:

Pharmaceutical Research

Year:

1997

File:

PDF, 2.18 MB

1997

32

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Effect of polymer structure on dissolution-rate characteristics in carboxylated alicyclic polymers for 193-nm lithography

Iwasa, Shigeyuki, Maeda, Katsumi, Nakano, Kaichiro, Hasegawa, Etsuo, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 363 KB

english, 1997

33

Electrochemical and spectroscopic measurements for stable nitroxyl radicals

Kentaro Nakahara, Shigeyuki Iwasa, Jiro Iriyama, Yukiko Morioka, Masahiro Suguro, Masaharu Satoh, Elton J. Cairns

Journal:

Electrochimica Acta

Year:

2006

Language:

english

File:

PDF, 753 KB

english, 2006

34

SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks

Seki, Yuko, Ushioda, Jun, Saito, Takashi, Maeda, Katsumi, Nakano, Kaichiro, Iwasa, Shigeyuki, Ohfuji, Takeshi, Tanabe, Hiroshi, Aizaki, Naoaki

Year:

1997

Language:

english

File:

PDF, 208 KB

english, 1997

35

10.1295/kobunshi.48.349

IWASA, Shigeyuki

Journal:

Year:

1999

File:

PDF, 1.50 MB

1999

36

Cell properties for modified PTMA cathodes of organic radical batteries

Kentaro Nakahara, Jiro Iriyama, Shigeyuki Iwasa, Masahiro Suguro, Masaharu Satoh, Elton J. Cairns

Journal:

Journal of Power Sources

Year:

2007

Language:

english

File:

PDF, 875 KB

english, 2007

37

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Novel negative photoresist based on polar alicyclic polymers for ArF excimer laser lithography

Iwasa, Shigeyuki, Nakano, Kaichiro, Maeda, Katsumi, Hasegawa, Etsuo, Conley, Will

Year:

1998

Language:

english

File:

PDF, 897 KB

english, 1998

38

Erratum: Flexibility and High-Rate Discharge Properties of Organic Radical Batteries with Gel-State Electrodes [ J. Electrochem. Soc., 164 , A884 (2017)]

Iwasa, Shigeyuki, Nishi, Takanori, Sato, Hideyuki, Nakamura, Shin

Journal:

Journal of The Electrochemical Society

Year:

2017

Language:

english

File:

PDF, 55 KB

english, 2017

39

High-rate capable organic radical cathodes for lithium rechargeable batteries

Kentaro Nakahara, Jiro Iriyama, Shigeyuki Iwasa, Masahiro Suguro, Masaharu Satoh, Elton J. Cairns

Journal:

Journal of Power Sources

Year:

2007

Language:

english

File:

PDF, 524 KB

english, 2007

40

Flexibility and High-Rate Discharge Properties of Organic Radical Batteries with Gel-State Electrodes

Iwasa, Shigeyuki, Nishi, Takanori, Sato, Hideyuki, Nakamura, Shin

Journal:

Journal of The Electrochemical Society

Year:

2017

Language:

english

File:

PDF, 776 KB

english, 2017

41

Fabrication of a Practical and Polymer-Rich Organic Radical Polymer Electrode and its Rate Dependence

Masahiro Suguro, Shigeyuki Iwasa, Kentaro Nakahara

Journal:

Macromolecular Rapid Communications

Year:

2008

Language:

english

File:

PDF, 390 KB

english, 2008

42

Bileaflet mechanical valve replacement: an assessment of outcomes with 30 years of follow-up

Saito, Satoshi, Tsukui, Hiroyuki, Iwasa, Shizuko, Umehara, Nobuhiro, Tomioka, Hideyuki, Aomi, Shigeyuki, Yamazaki, Kenji

Journal:

Interactive Cardiovascular and Thoracic Surgery

Year:

2016

Language:

english

File:

PDF, 813 KB

english, 2016

43

Al-laminated film packaged organic radical battery for high-power applications

Kentaro Nakahara, Jiro Iriyama, Shigeyuki Iwasa, Masahiro Suguro, Masaharu Satoh, Elton J. Cairns

Journal:

Journal of Power Sources

Year:

2007

Language:

english

File:

PDF, 334 KB

english, 2007

44

Living Cationic Polymerization of Benzyl Vinyl Ether and Its Block Copolymers with Narrow Molecular Weight Distribution

Aoshima, Sadahito, Iwasa, Shigeyuki, Kobayashi, Eiichi

Journal:

Polymer Journal

Year:

1994

File:

PDF, 866 KB

1994

45

[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Effect of Ethylene Oxide Structures in TEMPO Polymers on High-Rate Discharge Properties

Suguro, Masahiro, Iwasa, Shigeyuki, Nakahara, Kentaro

Year:

2009

Language:

english

File:

PDF, 303 KB

english, 2009

46

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Transparent photoacid generator (ALS) for ArF excimer laser lithography and chemically amplified resist

Nakano, Kaichiro, Maeda, Katsumi, Iwasa, Shigeyuki, Yano, Jun-ichi, Ogura, Yukio, Hasegawa, Etsuo, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 337 KB

english, 1994

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